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THE TECHNOLOGY BREAKTHROUGH

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The technology being developed and commercialised by BluGlass is a process for manufacturing semiconductor materials for high efficiency devices such as LEDs and solar cells.

This process called Remote Plasma Chemical Vapour Deposition (RPCVD) has the potential to offer many advantages over current manufacturing techniques.

BluGlass’ breakthrough was in the development of a process that allowed RPCVD to be used to grow group III nitride thin films at lower temperatures and importantly without the oxygen contamination that has previously limited its use in this field.

Currently a process called MOCVD is the most widely used in the production of high brightness LEDs. This process requires much higher growth temperatures of typically over 1000°C, the use of expensive and toxic ammonia and costly substrates such as sapphire or silicon carbide (SiC).

The BluGlass IP portfolio now comprises eight patents lodged, three in international filing and one accepted in the USA, South Africa and Singapore.
 

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RPCVD VS MOCVD

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mocvd-vs-rpcvd

Potential RPCVD Advantages

- Nitrogen vs. Ammonia
- Cost effective
- Clean exhaust
- Lower temperature
- Cheaper substrates such as glass or silicon
- Lower reactor running costs
- 6 inch substrates V. 2 or 4 inch substrates
- More devices per run
- Further cost and production efficiencies

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